PDRN Air Cloud Sunscreen SPF 50+

VT Cosmetics

PDRN Air Cloud Sunscreen SPF 50+

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About this product

The VT Cosmetics PDRN Air Cloud Sunscreen SPF 50+ is a sunscreen. Our analysis of its 52 ingredients (40 low-risk) rates it Excellent (99/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
52
Low-risk
40
Fragrance
Fragrance-free
Origin
South Korea
SPF
50 · blocks 98.0% UVB

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 15/5
Good for dry skin
Glyceryl Stearate Dimethylsilanol Hyaluronate Sodium Acetylated Hyaluronate Sodium Hyaluronate Crosspolymer Ectoin Panax Ginseng Root Extract Butylene Glycol Sodium Hyaluronate Glycerin Polyglyceryl-3 Distearate Hydroxypropyltrimonium Hyaluronate Hydrolyzed Hyaluronic Acid Hyaluronic Acid Dibutyl Adipate Sodium Hyaluronate Dimethylsilanol
Caution for dry skin
Xanthan Gum Glycerin Potassium Cetyl Phosphate Polyglyceryl-3 Distearate Silica
Oily/Acne-Prone Skin No data
Sensitive Skin 2/4
Good for sensitive skin
Panax Ginseng Root Extract Glycerin
Caution for sensitive skin
Butylene Glycol Glycerin Citric Acid Tromethamine

Ingredients list

52 total
Lower hazard (1) Higher hazard (4)
All52 Skin Conditioning42 Humectant12 Solvent9 Viscosity Controlling8 Emulsion Stabilising7 Uv Filter6 Hair Conditioning6 Emollient5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Dibutyl Adipate
(Plasticizer, Skin Conditioning, Emollient, Solvent, Film Forming)
Terephthalylidene Dicamphor Sulfonic Acid
(Uv Absorber, Uv Filter)
1
A
1,2-Hexanediol
(Solvent)
1
A
Panax Ginseng Root Extract
(Emollient, Hair Conditioning, Skin Protecting, Tonic)
1
Sodium DNA
(Skin Conditioning)
1
B
Butyloctyl Salicylate
(Hair Conditioning, Skin Conditioning, Solvent)
1
Ethylhexyl Triazone
(Uv Absorber, Uv Filter)
1
Polyglyceryl-3 Distearate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
A
Niacinamide
(Hair Conditioning, Skin Conditioning, Smoothing)
4
Drometrizole Trisiloxane
(Uv Absorber, Uv Filter)
1
Polymethylsilsesquioxane
(Opacifying)
2
Diethylamino Hydroxybenzoyl Hexyl Benzoate
(Uv Absorber, Uv Filter)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
2
A
Tromethamine
(Fragrance, Ph Adjuster, Buffering Agent, Masking)
1
Poly C10-30 Alkyl Acrylate
(Binding Agent, Emulsion Stabilising, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
Methylpropanediol
(Solvent)
1
Polyether-1
(Viscosity Increasing Agent, Viscosity Controlling)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Biosaccharide Gum-1
(Skin Conditioning)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Caprylyl Methicone
(Skin Conditioning)
1
2
A
Silica
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Opacifying, Viscosity Controlling)
Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine
(Skin Conditioning, Uv Absorber, Uv Filter)
1
B
Potassium Cetyl Phosphate
(Emulsifying, Surfactant)
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
1
Adenosine
(Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Camellia Japonica Seed Extract
(Skin Conditioning)
3-O-ETHYL ASCORBIC ACID
(Skin Conditioning)
Zinc Hydrolyzed Hyaluronate
(Humectant, Skin Conditioning)
1
A
Hyaluronic Acid
(Skin Conditioning, Viscosity Increasing Agent, Antistatic Agent, Humectant, Moisturising)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Dimethylsilanol Hyaluronate
(Skin Conditioning, Humectant, Moisturising)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)
Hydrolyzed Sodium Hyaluronate
(Skin Conditioning)
1
Sodium Hyaluronate Crosspolymer
(Humectant, Skin Conditioning)
1
Hydroxypropyltrimonium Hyaluronate
(Film Forming, Humectant)
1
Sodium Acetylated Hyaluronate
(Humectant)
Sodium Hyaluronate Dimethylsilanol
(Humectant, Skin Conditioning)
1
Ectoin
(Buffering Agent, Skin Conditioning, Emollient)
Solidago Virgaurea Extract
(Skin Conditioning)
Eugenia Caryophyllus Bud Extract
(Perfuming, Skin Conditioning)
Buddleja Officinalis Flower Extract
(Uv Filter)
1
Dipeptide Diaminobutyroyl Benzylamide Diacetate
(Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Dibutyl Adipate
Skin Conditioning, Emollient
Terephthalylidene Dicamphor Sulfonic Acid
Uv Absorber, Uv Filter
Panax Ginseng Root Extract
Emollient, Skin Protecting
Sodium DNA
Skin Conditioning
Butyloctyl Salicylate
Skin Conditioning
Ethylhexyl Triazone
Uv Absorber, Uv Filter

Benefits

Good for dry skin

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Dibutyl Adipate
Plasticizer, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A PlasticizerSkin conditioningEmollientSolventFilm forming
Terephthalylidene Dicamphor Sulfonic Acid
Uv absorber, Uv filter
Limited public safety data.Read moreShow less
EWG N/A Uv absorberUv filter
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Panax Ginseng Root Extract
Emollient, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientHair conditioningSkin protectingTonic
Sodium DNA
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Butyloctyl Salicylate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSolvent
Ethylhexyl Triazone
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 1 Uv absorberUv filter
Polyglyceryl-3 Distearate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningEmollientEmulsifyingSurfactant
Niacinamide
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningSmoothing
Drometrizole Trisiloxane
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Polymethylsilsesquioxane
Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 Opacifying
Diethylamino Hydroxybenzoyl Hexyl Benzoate
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Tromethamine
Fragrance, Ph adjuster
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A FragrancePh adjusterBuffering agentMasking
Poly C10-30 Alkyl Acrylate
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Binding agentEmulsion stabilisingViscosity increasing agentViscosity controlling
+ 31 more — see the full ingredients list above
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

Vitamin C (ascorbic) 5–20%

L-ascorbic acid is usually used at 5–20% (around 10–15% is common). Above ~20% adds little and tends to irritate more; it also needs a low pH to work.

3-O-ETHYL ASCORBIC ACID

Niacinamide 2–5% (up to 10%)

Most research uses 2–5%; some formulas go to 10%. Very high levels can cause flushing in sensitive skin.

Niacinamide

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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