Wavetech Wave Foam

Xmondo

Where to buy Possibly in stock

About this product

The Xmondo Wavetech Wave Foam is a misc. Our analysis of its 21 ingredients (12 low-risk) rates it Excellent (82/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
21
Low-risk
12
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/2
Good for dry skin
Glycerin
Caution for dry skin
Glycerin Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 1/8
Good for sensitive skin
Glycerin
Caution for sensitive skin
Dipropylene Glycol Glycerin Phenoxyethanol Linalool Alpha-Isomethyl Ionone Hexyl Cinnamal Limonene Benzyl Salicylate

Ingredients list

21 total
Lower hazard (1) Higher hazard (7)
All21 Skin Conditioning7 Fragrance7 Hair Conditioning6 Antistatic Agent5 Solvent4 Masking4 Perfuming4 Film Forming4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
PG-Hydroxyethylcellulose Cocodimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
VP/DMAPA Acrylates Copolymer
(Hair Fixing)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
Polyquaternium-70
(Hair Conditioning)
3
A
PEG-12 Dimethicone
(Hair Conditioning, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
PARFUM
(Fragrance, Perfuming)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
5
Alpha-Isomethyl Ionone
(Perfuming, Skin Conditioning)
Allergens
Allergens
2
CI 17200
(Cosmetic Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Panthenol
Skin Conditioning
PEG-12 Dimethicone
Skin Conditioning
Ethylhexylglycerin
Skin Conditioning
Benzyl Salicylate
Uv Absorber

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Benzyl Salicylate — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PG-Hydroxyethylcellulose Cocodimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
VP/DMAPA Acrylates Copolymer
Hair fixing
Low-hazard ingredient.Read moreShow less
EWG 1 Hair fixing
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Polyquaternium-70
Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioning
PEG-12 Dimethicone
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
CI 17200
Cosmetic colorant
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic colorant
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Alpha-Isomethyl Ionone
Perfuming, Skin conditioning
Moderate-hazard ingredient.Read moreShow less
EWG 5 PerfumingSkin conditioning Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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