Hy! Amino+ 20% Centella Barrier Low pH Gel Cleanser

Y.O.U

Hy! Amino+ 20% Centella Barrier Low pH Gel Cleanser

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About this product

The Y.O.U Hy! Amino+ 20% Centella Barrier Low pH Gel Cleanser is a cleanser. Our analysis of its 51 ingredients (39 low-risk) rates it Excellent (97/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
51
Low-risk
39
Fragrance
Fragrance-free
Origin
Indonesia

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/16
Good for dry skin
Squalane Caprylic/Capric Triglyceride Butylene Glycol Glycerin PEG-7 Glyceryl Cocoate
Caution for dry skin
Decyl Glucoside Disodium Cocoyl Glutamate Lauryl Glucoside Sodium Lauroyl Glutamate Sodium Methyl Cocoyl Taurate Sodium Cocoyl Glycinate Sodium Cocoyl Alaninate Sodium Cocoyl Isethionate Glycerin Potassium Cocoyl Glycinate Sodium C14-16 Olefin Sulfonate Hydrogenated Lecithin Sodium Lauroyl Sarcosinate PEG-7 Glyceryl Cocoate Sodium Lauryl Glucose Carboxylate Sodium Taurine Cocoyl Methyltaurate
Oily/Acne-Prone Skin No data
Sensitive Skin 4/11
Good for sensitive skin
Madecassoside Asiaticoside Glycerin Hydroxyacetophenone
Caution for sensitive skin
Glycine Sodium Chloride Asiaticoside Calendula Officinalis Flower Extract Caprylic/Capric Triglyceride Butylene Glycol Glycerin Sodium Benzoate Sorbic Acid Potassium Sorbate Phenoxyethanol

Ingredients list

51 total
Lower hazard (1) Higher hazard (4)
All51 Skin Conditioning36 Hair Conditioning18 Surfactant14 Cleansing9 Fragrance8 Antistatic Agent7 Viscosity Controlling7 Solvent6
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Centella Asiatica Leaf Extract
(Skin Conditioning)
1
Lauryl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
1
B
Potassium Cocoyl Glycinate
(Hair Conditioning, Surfactant)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Cocoyl Glycinate
(Hair Conditioning, Skin Conditioning, Surfactant Cleansingagent)
Acrylates/Steareth-20 Methacrylate Crosspolymer
(Film Forming)
Sodium Lauryl Glucose Carboxylate
(Cleansing, Surfactant)
1
B
Disodium Cocoyl Glutamate
(Cleansing, Surfactant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
1
Hydroxyacetophenone
(Antioxidant)
4
B
PEG-7 Glyceryl Cocoate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
1
A
1,2-Hexanediol
(Solvent)
Monosodium Citrate
(Buffering Agent)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
3
A
Sorbic Acid
(Fragrance, Preservative)
1
Gardenia Florida Flower Extract
(Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Glycine
(Buffering Agent, Fragrance, Hair Conditioning, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
Bisabolol
(Fragrance, Skin Conditioning, Soothing)
1
A
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning)
1
A
Beta-Glucan
(Bulking Agent, Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Hydrolyzed Oats
(Hair Conditioning, Skin Conditioning, Antistatic Agent)
3
B
Sodium Lauroyl Sarcosinate
(Antistatic Agent, Cleansing, Emulsifying, Foaming, Hair Conditioning, Skin Conditioning, Surfactant, Viscosity Controlling)
1
B
Sodium Cocoyl Alaninate
(Hair Conditioning, Surfactant)
1
B
Sodium Lauroyl Glutamate
(Antistatic Agent, Hair Conditioning, Surfactant)
B
Sodium Taurine Cocoyl Methyltaurate
(Cleansing, Emulsifying, Surfactant)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Calendula Officinalis Flower Extract
(Masking, Perfuming, Skin Conditioning)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
2
A
Hydrogenated Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Suspending Agent Nonsurfactant)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
A
Potassium Sorbate
(Fragrance, Preservative)
1
Madecassoside
(Antioxidant, Skin Conditioning)
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
Ceramide NS
(Hair Conditioning, Skin Conditioning)
Ceramide AS
(Hair Conditioning, Skin Conditioning)
1
Asiatic Acid
(Skin Conditioning, Stabilising)
1
Madecassic Acid
(Skin Conditioning)
Ceramide EOP
(Hair Conditioning, Skin Conditioning)
Ceramide AP
(Hair Conditioning, Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Centella Asiatica Leaf Extract
Skin Conditioning
Lauryl Hydroxysultaine
Skin Conditioning
Sodium Cocoyl Glycinate
Skin Conditioning
Hydroxyacetophenone
Antioxidant
PEG-7 Glyceryl Cocoate
Skin Conditioning, Emollient
Gardenia Florida Flower Extract
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Centella Asiatica Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioning
Lauryl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Potassium Cocoyl Glycinate
Hair conditioning, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSurfactant
Sodium Cocoyl Glycinate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSurfactant - cleansingagent
Acrylates/Steareth-20 Methacrylate Crosspolymer
Film forming
Limited public safety data.Read moreShow less
EWG N/A Film forming
Sodium Lauryl Glucose Carboxylate
Cleansing, Surfactant
Limited public safety data.Read moreShow less
EWG N/A CleansingSurfactant
Disodium Cocoyl Glutamate
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Lauryl Glucoside
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Monosodium Citrate
Buffering agent
Limited public safety data.Read moreShow less
EWG N/A Buffering agent
+ 28 more — see the full ingredients list above
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
PEG-7 Glyceryl Cocoate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Skin conditioningEmollientEmulsifyingSurfactant Fungal-acne trigger
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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