Centella Relief Cleansing Water

Yoon Skin

Where to buy Possibly in stock

About this product

The Yoon Skin Centella Relief Cleansing Water is a makeup remover. Our analysis of its 22 ingredients (21 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Makeup Removers
Ingredients
22
Low-risk
21
Fragrance
Fragrance-free
Origin
Myanmar

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/6
Good for dry skin
Cetyl Ethylhexanoate Ethylhexyl Palmitate Caprylic/Capric Triglyceride Butylene Glycol Polyglyceryl-4 Caprate Polyglyceryl-6 Caprylate
Caution for dry skin
Centella Asiatica Extract Polyglyceryl-10 Myristate Polyglyceryl-4 Caprate Polyglyceryl-6 Ricinoleate Polyglyceryl-6 Caprylate Polyglyceryl-3 Cocoate
Oily/Acne-Prone Skin No data
Sensitive Skin 3/8
Good for sensitive skin
Madecassoside Centella Asiatica Extract Asiaticoside
Caution for sensitive skin
Dipropylene Glycol Sodium Citrate Asiaticoside Ethylhexyl Palmitate Caprylic/Capric Triglyceride Butylene Glycol Citric Acid Phenoxyethanol

Ingredients list

22 total
Lower hazard (1) Higher hazard (4)
All22 Skin Conditioning20 Solvent5 Fragrance5 Masking5 Surfactant5 Emollient5 Emulsifying5 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
B
Polyglyceryl-4 Caprate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
B
Polyglyceryl-6 Caprylate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
B
Polyglyceryl-3 Cocoate
(Emulsifying, Surfactant)
1
B
Polyglyceryl-6 Ricinoleate
(Skin Conditioning, Emulsifying, Surfactant)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
1,2-Hexanediol
(Solvent)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
Polyglyceryl-10 Myristate
(Skin Conditioning, Emulsifying, Surfactant)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Cetyl Ethylhexanoate
(Skin Conditioning, Emollient)
1
B
Ethylhexyl Palmitate
(Fragrance, Skin Conditioning, Emollient, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
1
Asiatic Acid
(Skin Conditioning, Stabilising)
1
Madecassoside
(Antioxidant, Skin Conditioning)
1
Madecassic Acid
(Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Polyglyceryl-4 Caprate
Skin Conditioning, Emollient
Polyglyceryl-6 Caprylate
Skin Conditioning, Emollient
Polyglyceryl-6 Ricinoleate
Skin Conditioning
Ethylhexylglycerin
Skin Conditioning
Polyglyceryl-10 Myristate
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Polyglyceryl-4 Caprate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
Polyglyceryl-6 Caprylate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
Polyglyceryl-3 Cocoate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Polyglyceryl-6 Ricinoleate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Polyglyceryl-10 Myristate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningEmulsifyingSurfactant
Cetyl Ethylhexanoate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollient
Caprylic/Capric Triglyceride
Emollient, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientMaskingPerfumingSkin conditioningSolvent
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Asiaticoside
Antioxidant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AntioxidantSkin conditioningPerfuming
+ 3 more — see the full ingredients list above
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Ethylhexyl Palmitate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningEmollientPerfuming Fungal-acne trigger

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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