Semi Di Lino Scalp Rebalance Purifying Low Shampoo

Alfaparf Milano

Semi Di Lino Scalp Rebalance Purifying Low Shampoo

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About this product

The Alfaparf Milano Semi Di Lino Scalp Rebalance Purifying Low Shampoo is a misc. Our analysis of its 34 ingredients (26 low-risk) rates it Excellent (95/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
34
Low-risk
26
Fragrance
Contains fragrance
Origin
Italy
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/10
Good for dry skin
Glycol Distearate Butylene Glycol Glycerin Coconut Acid Lactic Acid
Caution for dry skin
Lysine Thiazolidine Carboxylate Sodium Isethionate Sodium Cocoyl Isethionate Alpha-Glucan Oligosaccharide Glycerin Coconut Acid Acrylates Copolymer Laureth-2 Sodium Hydroxide Laureth-4
Oily/Acne-Prone Skin No data
Sensitive Skin 1/9
Good for sensitive skin
Glycerin
Caution for sensitive skin
Barosma Betulina Leaf Extract Sodium Chloride Butylene Glycol Glycerin Sodium Benzoate Potassium Sorbate Lactic Acid Phenoxyethanol Laureth-4

Ingredients list

34 total
Lower hazard (1) Higher hazard (6)
All34 Skin Conditioning23 Fragrance7 Film Forming7 Antistatic Agent6 Viscosity Controlling6 Cleansing5 Surfactant5 Humectant4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
B
Disodium Laureth Sulfosuccinate
(Sufactant, Foam Boosting, Hydrotrope, Foaming)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Coconut Acid
(Cleansing, Emollient, Emulsifying, Surfactant)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
PARFUM
(Fragrance, Perfuming)
2
Piroctone Olamine
(Cosmetic Biocide, Preservative)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
A
Polyquaternium-22
(Antistatic Agent, Film Forming, Hair Fixing)
1
B
Sodium Isethionate
(Antistatic Agent, Cleansing, Hair Conditioning, Skin Conditioning)
2
3
B
Laureth-4
(Antistatic Agent, Emulsifying, Masking, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
4
B
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
B
Laureth-2
(Cleansing, Emulsifying, Surfactant)
3
PEG/PPG-120/10 Trimethylolpropane Trioleate
(Viscosity Controlling)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Lysine Carboxymethyl Cysteinate
(Skin Conditioning)
1
Barosma Betulina Leaf Extract
(Skin Conditioning, Perfuming)
1
Lysine Thiazolidine Carboxylate
(Skin Conditioning, Surfactant)
1
Alpha-Glucan Oligosaccharide
(Cleansing, Skin Conditioning, Smoothing)
1
Carnosine
(Skin Conditioning)
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
Lactococcus Ferment Lysate
(Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Linum Usitatissimum Seed Extract
(Perfuming, Skin Conditioning)
A
Biosaccharide Gum-4
(Skin Conditioning)
1
A
Caesalpinia Spinosa Gum
(Adhesive, Skin Conditioning, Viscosity Increasing Agent, Film Forming, Viscosity Controlling)
3
A
Potassium Sorbate
(Fragrance, Preservative)

My Ingredient Notes

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Coconut Acid
Emollient
Glycol Distearate
Emollient, Skin Conditioning
Sodium Isethionate
Skin Conditioning
Lactic Acid
Exfoliant, Humectant
Ethylhexylglycerin
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Scar HealingImproves the look of marks and scars.
Anti-AgingSoftens lines and helps skin look youthful.
Redness ReducingSoothes visible redness and calms irritation.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Disodium Laureth Sulfosuccinate
Sufactant, Foam boosting
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B SufactantFoam boostingHydrotropeFoaming
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Coconut Acid
Cleansing, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingEmollientEmulsifyingSurfactant
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Piroctone Olamine
Cosmetic biocide, Preservative
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic biocidePreservative
Polyquaternium-22
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Sodium Isethionate
Antistatic agent, Cleansing
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentCleansingHair conditioningSkin conditioning
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Laureth-2
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B CleansingEmulsifyingSurfactant
+ 11 more — see the full ingredients list above
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Laureth-4
Antistatic agent, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 2–3 CIR B Antistatic agentEmulsifyingMaskingSurfactant Bad for Oily Skin
Lactic Acid
Exfoliant, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B ExfoliantFragranceHumectantPh adjusterSkin-conditioning agent -humectantSkin conditioningBuffering agent Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Lactic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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