Peri-Social

Holo Taco

Where to buy Possibly in stock

About this product

The Holo Taco Peri-Social is a misc. Our analysis of its 26 ingredients (19 low-risk) rates it Excellent (98/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
26
Low-risk
19
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/4
Caution for dry skin
Nitrocellulose Stearalkonium Bentonite Acrylates Copolymer Silica
Oily/Acne-Prone Skin No data
Sensitive Skin 2/6
Good for sensitive skin
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate Tocopheryl Acetate
Caution for sensitive skin
Diacetone Alcohol Butyl Acetate Acetyl Tributyl Citrate Ethyl Acetate Phosphoric Acid Isopropyl Alcohol

Ingredients list

26 total
Lower hazard (1) Higher hazard (4)
All26 Film Forming8 Fragrance6 Colorant6 Solvent5 Cosmetic Colorant4 Plasticizer4 Masking3 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
A
Butyl Acetate
(Fragrance, Solvent, Masking)
1
Ethyl Acetate
(Fragrance, Solvent, Perfuming)
1
Nitrocellulose
(Film Forming, Suspending Agent Nonsurfactant)
1
Acetyl Tributyl Citrate
(Fragrance, Plasticizer, Film Forming, Masking, Perfuming)
Norbornanediamine/Resorcinol Diglycidyl Ether Crosspolymer
(Film Forming)
1
Adipic Acid/Neopentyl Glycol/Trimellitic Anhydride Copolymer
(Film Forming)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Stearalkonium Bentonite
(Suspending Agent Nonsurfactant, Gel Forming, Viscosity Controlling)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
A
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
(Antioxidant)
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
1
2
A
Silica
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Opacifying, Viscosity Controlling)
4
A
Benzophenone-1
(Uv Absorber)
1
Trimethylpentanediyl Dibenzoate
(Plasticizer)
Methoxyisopropyl Acetate
(Solvent)
1
Diacetone Alcohol
(Fragrance, Solvent, Masking)
1
B
Phosphoric Acid
(Fragrance, Ph Adjuster, Buffering Agent)
CI 77891
(Colorant)
CI 77007
(Colorant)
CI 77002
(Colorant)
1
CI 45410
(Cosmetic Colorant)
3
CI 60730
(Cosmetic Colorant)
3
CI 19140
(Colorant, Cosmetic Colorant)
2
CI 77499
(Colorant, Cosmetic Colorant)
CI 77510
(Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Antioxidants
Shields skin from free radical damage.
Vitamin E
Protects skin and soothes irritation.
Exfoliators
Removes dead skin cells to smoothe texture.

Benefits

BrighteningRestores radiance to dull, tired skin.
Good For Oily SkinBalances oil and helps reduce shine.
Reduces Large PoresMinimizes the look of enlarged pores.

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Butyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventMasking
Ethyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventPerfuming
Nitrocellulose
Film forming, Suspending agent - nonsurfactant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingSuspending agent - nonsurfactant
Acetyl Tributyl Citrate
Fragrance, Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 FragrancePlasticizerFilm formingMaskingPerfuming
Norbornanediamine/Resorcinol Diglycidyl Ether Crosspolymer
Film forming
Limited public safety data.Read moreShow less
EWG N/A Film forming
Adipic Acid/Neopentyl Glycol/Trimellitic Anhydride Copolymer
Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Film forming
Stearalkonium Bentonite
Suspending agent - nonsurfactant, Gel forming
Low-hazard ingredient.Read moreShow less
EWG 1 Suspending agent - nonsurfactantGel formingViscosity controlling
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antioxidant
Styrene/Acrylates Copolymer
Film forming, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Film formingOpacifying
Silica
Abrasive, Absorbent
Low-hazard ingredient.Read moreShow less
EWG 1–2 CIR A AbrasiveAbsorbentAnticaking agentBulking agentOpacifyingViscosity controlling
Benzophenone-1
Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Uv absorber
Trimethylpentanediyl Dibenzoate
Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 Plasticizer
Methoxyisopropyl Acetate
Solvent
Limited public safety data.Read moreShow less
EWG N/A Solvent
Diacetone Alcohol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventMasking
+ 9 more — see the full ingredients list above
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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