Elseve Nutri Gloss Après-Shampooing Démêlant Brillance Miroir enrichi en Perle de Nacre

L'Oréal

Elseve Nutri Gloss Après-Shampooing Démêlant Brillance Miroir enrichi en Perle de Nacre

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About this product

The L'Oréal Elseve Nutri Gloss Après-Shampooing Démêlant Brillance Miroir enrichi en Perle de Nacre is a misc. Our analysis of its 34 ingredients (26 low-risk) rates it Excellent (92/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
34
Low-risk
26
Fragrance
Contains fragrance
Origin
France

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/12
Good for dry skin
Glycol Distearate Glycereth-26 Glycerin Propylene Glycol Hydrogenated Coconut Acid
Caution for dry skin
Decyl Glucoside Sodium Lauryl Sulfoacetate Sodium Isethionate Sodium Cocoyl Isethionate Glycerin Trideceth-6 Hydrogenated Coconut Acid Cetrimonium Chloride Sodium Lauroyl Sarcosinate Sodium Hydroxide PEG-55 Propylene Glycol Oleate PPG-5-Ceteth-20
Oily/Acne-Prone Skin No data
Sensitive Skin 1/9
Good for sensitive skin
Glycerin
Caution for sensitive skin
Sodium Chloride Glycerin Propylene Glycol Citric Acid Benzoic Acid Sodium Benzoate Linalool Hexyl Cinnamal Methylisothiazolinone

Ingredients list

34 total
Lower hazard (1) Higher hazard (7)
All34 Fragrance9 Skin Conditioning9 Surfactant8 Viscosity Controlling8 Antistatic Agent7 Hair Conditioning6 Masking6 Emulsifying6
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Lauryl Sulfoacetate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
2
B
Disodium Laureth Sulfosuccinate
(Sufactant, Foam Boosting, Hydrotrope, Foaming)
3
B
Sodium Lauroyl Sarcosinate
(Antistatic Agent, Cleansing, Emulsifying, Foaming, Hair Conditioning, Skin Conditioning, Surfactant, Viscosity Controlling)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
1
A
Hydrogenated Coconut Acid
(Opacifying, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Hydrogenated Coconut Acid., Emollient, Emulsifying, Skin Conditioning)
Fungal Acne
Fungal Acne Trigger
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
B
Sodium Isethionate
(Antistatic Agent, Cleansing, Hair Conditioning, Skin Conditioning)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
3
B
PPG-5-Ceteth-20
(Emulsifying, Surfactant)
3
A
PEG-55 Propylene Glycol Oleate
(Sufactant, Surfactant, Viscosity Controlling)
1
B
Trideceth-6
(Emulsifying, Surfactant)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Camelina Sativa Seed Oil
(Skin Conditioning)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
1
A
Amodimethicone
(Antistatic Agent, Hair Conditioning)
Silicone
Silicone
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
VITIS VINIFERA SEED OIL
(Skin Conditioning, Skin Conditioning Emollient)
6
B
Methylchloroisothiazolinone
(Preservative)
7
B
Methylisothiazolinone
(Preservative)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
prunus armeniaca kernel oil
(Fragrance, Skin Conditioning)
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
1
Glycereth-26
(Humectant, Viscosity Decreasing Agent, Solvent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Sodium Lauroyl Sarcosinate
Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning
Cocamidopropyl Betaine
Skin Conditioning
Hydrogenated Coconut Acid
Emollient, Skin Conditioning
Sodium Isethionate
Skin Conditioning
Camelina Sativa Seed Oil
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

Contains sulfate
Contains silicone
Contains eu allergen
Not fungal acne (malassezia) safe
Methylisothiazolinone — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Disodium Laureth Sulfosuccinate
Sufactant, Foam boosting
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B SufactantFoam boostingHydrotropeFoaming
Sodium Lauroyl Sarcosinate
Antistatic agent, Cleansing
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCleansingEmulsifyingFoamingHair conditioningSkin conditioningSurfactantViscosity controlling
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Sodium Isethionate
Antistatic agent, Cleansing
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentCleansingHair conditioningSkin conditioning
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
PPG-5-Ceteth-20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant
PEG-55 Propylene Glycol Oleate
Sufactant, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A SufactantSurfactantViscosity controlling
Trideceth-6
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Camelina Sativa Seed Oil
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioning
+ 6 more — see the full ingredients list above
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Sodium Lauryl Sulfoacetate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingFoamingSurfactant Sulfate
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Hydrogenated Coconut Acid
Opacifying, Sufactantsurfactant-cleansing agent is included as a function for the soap form of hydrogenated coconut acid.
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingSufactantsurfactant-cleansing agent is included as a function for the soap form of hydrogenated coconut acid.EmollientEmulsifyingSkin conditioning Fungal-acne trigger
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Amodimethicone
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning Silicone
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Methylchloroisothiazolinone
Preservative
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR B Preservative
Methylisothiazolinone
Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR B Preservative
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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