Kind Deep Cleanse Facial Wash

Skin Game

Kind Deep Cleanse Facial Wash

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About this product

The Skin Game Kind Deep Cleanse Facial Wash is a cleanser. Our analysis of its 14 ingredients (11 low-risk) rates it Excellent (94/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
14
Low-risk
11
Fragrance
Fragrance-free
Origin
Indonesia

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/4
Good for dry skin
Glycol Distearate Butylene Glycol Glycerin
Caution for dry skin
Lauric Acid Stearic Acid Glycerin Acrylates Copolymer
Oily/Acne-Prone Skin No data
Sensitive Skin 1/7
Good for sensitive skin
Glycerin
Caution for sensitive skin
Lauric Acid Myristic Acid Stearic Acid Butylene Glycol Glycerin Citric Acid Phenoxyethanol

Ingredients list

14 total
Lower hazard (1) Higher hazard (4)
All14 Skin Conditioning7 Fragrance7 Emulsifying4 Hair Conditioning4 Sufactant3 Solvent3 Viscosity Controlling3 Masking3
EWG CIR Ingredient Name & Cosmetic Functions Notes
Oryza sativa extract
(Abrasive, Absorbent, Bulking, Hair Conditioning, Skin Conditioning)
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Myristic Acid
(Fragrance, Opacifying, Sufactant, Emulsifying, Perfuming)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
A
Lauric Acid
(Fragrance, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Lauric Acid., Emulsifying)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Stearic Acid
(Fragrance, Sufactant, Emulsifying, Surfactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Stearic Acid., Emulsion Stabilising, Masking, Refatting)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
1,2-Hexanediol
(Solvent)

My Ingredient Notes

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Key ingredients

Oryza sativa extract
Skin Conditioning
Hydrolyzed Wheat Protein
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Cocamidopropyl Betaine
Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Oryza sativa extract
Abrasive, Absorbent
Limited public safety data.Read moreShow less
EWG N/A AbrasiveAbsorbentBulkingHair conditioningSkin conditioning
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Myristic Acid
Fragrance, Opacifying
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceOpacifyingSufactantEmulsifyingPerfuming Bad for Oily SkinFungal-acne trigger
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Lauric Acid
Fragrance, Sufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.Emulsifying Bad for Oily SkinFungal-acne trigger
Stearic Acid
Fragrance, Sufactant
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantEmulsifyingSurfactantsurfactant-cleansing agent is included as a function for the soap form of stearic acid.Emulsion stabilisingMaskingRefatting Bad for Oily SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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